AL series plasma systems
AL stands for aluminum chamber. It is mainly used in the semiconductor, solar, plastics and electronics industries.
Let our experts advise you.
We have often been able to custom-manufacture machines and systems that our customers thought were not feasible.
We are happy to develop a tailor-made solution that perfectly fits your requirements.
We develop your solution both on the system and on the process side.
AL stands for aluminum chamber. It is mainly used in the semiconductor, solar, plastics and electronics industries.
Our smallest AL-system.
A 19 inch rack with two frequencies for polymerization.
Slightly bigger version of the AL18 with more options and load capacity.
A space-saving system designed for smaller production facilities and laboratories. Available as compact or tabletop.
Ideal for medium sized substrates or PCB plates.
Offers 3 options for chamber size, depending on the size of substrates or process speed needed.
With automated door and adjustable work height for easier loading.
The absolute biggest AL-system we have to offer. For the largest substrates and quantities.
The Q stands for quartz glass chambers.
Easy to operate and simple to load. Our Q-series provides fast and reliable plasma processing.
A system with the diameter of our Q240S but with reduced chamber depth for the sake of saving space.
The biggest system in our Q-series. Perfect for multiple Wafers with sizes up to 200mm diameter.
Modified machine.
![AL900[1]](https://plasmaparylene.de/wp-content/uploads/2023/07/AL9001-400x400.jpg "AL900[1]")
Concentrated, more effective surface treatment and plasma generation.
This table allows the substrates placed on it to remain above a certain temperature level during coating or plasma treatment. Can be combined with wafer holders.
Similar to the heating table, this extra allows the substrates to be cooled as needed or maintained at a specific temperature level during treatment.
We offer several sizes of wafer holders that can be placed on our heating/cooling tables to hold wafers in place during ultracleaning or analysis.
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